論文名稱:

雙離子束濺鍍銅鋁氧化物薄膜之微結構與光電特性研究

The Microstructure and Opto-electric Properties of CuAlO2

研究生:

楊琮仁

指導教授:

劉啟昌

          學號:

97017006

畢業學年度:

98

      出版年:

民99

關鍵字:

銅鋁氧 Copper aluminum oxide

雙離子束濺鍍 Dual ion beam sputtering

穿透度 Transmittance

電阻率 Resistivity

摘要:

           透明與導電的薄膜，這兩種特性運用在產業的趨勢越來越多，對於奈米薄膜附著在各種元件的表面，增加元件上的導電能力與透明的表現，使電子與光電產業突破上的發展。由於薄膜大多是N 型的電性，P 型的薄膜特別少，阻礙了電子元件運用，目前銅鋁氧(Copper Aluminum oxide, CuAlO2)是一種優良的P 型的透明導電薄膜，並且擁有熱電與光伏的特性，是一種值得發展研究的材料。本研究主要以雙離子束濺鍍系統(Dual ion beam sputtering, DIBS)，使用CuAlO2 陶瓷靶材製備薄膜，探討氧流量與工作溫度對CuAlO2 薄膜光電特性之影     響，搭配補助離子束的放電電壓，與放電電流的改變對薄膜影響力，最後薄膜進行退火處理，探討薄膜光電性質的表現。在探討氧流量與工作溫度的實驗，結果顯示薄膜非晶的結構，影響薄膜的透明度，形貌顯示出薄膜氧化與結晶的過程，影響氧空缺的多寡，以及幾乎無法導電的特性。使用補助離子源低能量離子束的幫助，影響薄膜呈現平整緻密的表面，光學穿透度的提升，無法有效增加薄膜結晶與導電性。最後以退火處理，沒有改善結晶的情形，使薄膜的光學穿透度提升至82％左右，薄膜電阻率為20M  以上，幾乎   無法導電，因此屬於高品質的CuAlO2 透明薄膜。

Transparent and conductive thin films, these two characteristic           utilization are getting more and more in the industrial tendency, for nanometer thin film attached to the surface of the various components, increase in the device's conductivity and transparency of performance, to make a breakthrough on the electronic and optoelectronic industry

           development. Because the thin film mostly is the N electric properties, the P thin film are specially few, has hindered the electronic component utilization, currently copper and aluminum oxide (CuAlO2) is an excellent P-type transparent conductive film, and has the characteristics of thermoelectric and photovoltaic, is one kind is worth developing the           research material. The study by double ion beam sputtering system ,        preparation of thin film ceramic target using CuAlO2, of oxygen flow rate       and temperature on the optical characteristics of thin film effects CuAlO2, ion beam with a grant the discharge voltage, and discharge currents of influence on the film, the thin film carries on the annealing treatment, the discussion thin film electro-optic nature performance To investigate the oxygen flow rate and temperature of the experiment, the results showed that the structure of amorphous films, affect the transparency of films, shows the morphology and crystallization process of thin film oxidation, affect the amount of oxygen vacancies, and almost no conductive properties. Ion source using the subsidies help low-energy ion beam, affect the film surface showed smooth and dense, enhancement of the optical penetration, can effectively        increase the film crystallinity and conductivity. Finally by the annealing treatment, the situation does not improve crystal, So that the optical penetration increased to 82%, film resistivity of 20M  or more, almost impossible to conductive, a high-quality transparent film CuAlO2.