【Failure Analysis Laboratory】

Supervising Instructor: Prof. Hong-Yao Guo

Location: Room M104, Mechanical Engineering Building

【Laboratory Introduction】

This laboratory serves as a core R&D hub within the university for advancing futuristic materials engineering, advanced surface treatment, and optoelectronic technologies. Its research domain delves deeply into "Plasma Surface Modification of Metallic Materials" and "Vacuum Technology & Optoelectronic Thin Film Applications." By combining high-temperature mechanical testing with diverse thin-film deposition techniques, the laboratory is dedicated to pioneering high-value advanced materials and component development.

Plasma Surface Modification, Breaking Metallic Limits: Specializing in ion nitriding and plasma coating techniques to enhance the surface hardness, wear resistance, and corrosion resistance of metallic materials, while deeply investigating high-temperature fatigue mechanisms of materials.

Vacuum Coating Technology, Driving Optoelectronic Innovation: Centered on oxide and nitride thin films, the lab utilizes advanced dual ion beam sputtering technology to precisely tune optoelectronic thin-film properties, pioneering applications for next-generation components.

Advanced Testing & Measurement, Ensuring Ultimate Quality: Equipped with dynamic universal testing and hard-coating test systems, providing one-stop R&D capability spanning from material synthesis and surface modification to comprehensive mechanical and thin-film characterization.

【Research Focus】

1. Optoelectronic Thin Film Technology and Applications

2. Vacuum Technology and Applications

3. High-Temperature Material Fatigue and Research

4. Plasma Surface Modification and Research

【Core Processing & Equipment】

Thin Film & Deposition Systems: Dual Ion Beam Sputtering System, Plasma Surface Modification & Coating System

Mechanical & Property Characterization Equipment: Dynamic Universal Testing Machine, Hard-Coating Test System

【Laboratory Photos】

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